JPS622032B2 - - Google Patents
Info
- Publication number
- JPS622032B2 JPS622032B2 JP54157158A JP15715879A JPS622032B2 JP S622032 B2 JPS622032 B2 JP S622032B2 JP 54157158 A JP54157158 A JP 54157158A JP 15715879 A JP15715879 A JP 15715879A JP S622032 B2 JPS622032 B2 JP S622032B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- evaporation
- discharge
- source
- metal vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15715879A JPS5681671A (en) | 1979-12-04 | 1979-12-04 | Ion plating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15715879A JPS5681671A (en) | 1979-12-04 | 1979-12-04 | Ion plating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5681671A JPS5681671A (en) | 1981-07-03 |
JPS622032B2 true JPS622032B2 (en]) | 1987-01-17 |
Family
ID=15643444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15715879A Granted JPS5681671A (en) | 1979-12-04 | 1979-12-04 | Ion plating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5681671A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6009220B2 (ja) * | 2012-05-21 | 2016-10-19 | 住友重機械工業株式会社 | 成膜装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5123376B2 (en]) * | 1972-10-17 | 1976-07-16 | ||
JPS4990685A (en]) * | 1972-12-29 | 1974-08-29 | ||
JPS5232759B2 (en]) * | 1973-08-07 | 1977-08-23 | ||
JPS5258081A (en) * | 1975-11-10 | 1977-05-13 | Hitachi Ltd | Apparatus for attaching thin film |
-
1979
- 1979-12-04 JP JP15715879A patent/JPS5681671A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5681671A (en) | 1981-07-03 |
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